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dc.contributor.authorTelli, MB; Bharadwaja, SSN; Biegalski, MD; Trolier-McKinstry, S
dc.date.accessioned2020-07-01T08:50:14Z
dc.date.available2020-07-01T08:50:14Z
dc.date.issuedDEC 18
dc.date.issued2006
dc.identifier.urihttp://hdl.handle.net/20.500.12481/9475
dc.description.abstract(00l) epitaxial AgTaO3 and AgNbO3 thin films were prepared on (001)SrRuO3/(001)LaAlO3 substrates by chemical solution deposition. The dielectric constants and loss of similar to 300 nm thick films were 110 +/- 10 and 0.025 +/- 0.005 for AgTaO3 and 550 +/- 55 and 0.020 +/- 0.005 for AgNbO3 at room temperature. In both films, the temperature coefficient of capacitance is smaller than that for bulk ceramics of the same composition. The capacitance changes from -20 to 120 degrees C were <= 1.2% for AgTaO3 and <= 3.6% for AgNbO3. The tunability of the AgTaO3 film was 1.6% at 230 kV/cm field, while 21% tunability was measured for AgNbO3 at 190 kV/cm. (c) 2006 American Institute of Physics.
dc.title(00l) epitaxial AgTaO3 and AgNbO3 thin films on (001)SrRuO3/(001)LaAlO3 substrates by chemical solution deposition
dc.title.alternativeAPPLIED PHYSICS LETTERS
dc.identifier.DOI-ID10.1063/1.2403918
dc.identifier.volume89
dc.identifier.issue25
dc.identifier.issn/e-issn0003-6951
dc.identifier.issn/e-issn1077-3118


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